Silicon Film and Surface Preparation

Silicon Film and Surface Preparation
Author : Hitoshi Habuka
Publisher : LAP Lambert Academic Publishing
Total Pages : 504
Release : 2014-08-04
ISBN 10 : 3659583006
ISBN 13 : 9783659583001
Language : EN, FR, DE, ES & NL

Silicon is an excellent material for microelectronics, power electronics and solar cells. For these applications, silicon films and surfaces are convenient. But, its production needs significantly high level process technology and engineering. This book provides the scientific approaches to the actual semiconductor silicon production problems. By separating and classifying the phenomena into chemistry, physics and chemical engineering, really simple understanding is possible. The silicon epitaxial growth and doping are the combination of chemical reactions occurring under the gas flow and temperature fields. The etching and surface contamination are similar. Rapid thermal process and flash lamp annealing are simple physics. For solving the cross linked chemistry and physics, numerical calculations are the useful and powerful tool. From the work considering the classical and advanced chemistry utilizing hydrogen, trichlorosilane, chlorine trifluoride and other gases, scientists and engineers will find a new route shedding future materials process development.

Silicon Film and Surface Preparation
Language: en
Pages: 504
Authors: Hitoshi Habuka
Categories:
Type: BOOK - Published: 2014-08-04 - Publisher: LAP Lambert Academic Publishing

Silicon is an excellent material for microelectronics, power electronics and solar cells. For these applications, silicon films and surfaces are convenient. But
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Semiconductor wafer bonding continues to evolve as a crucial technology extending new integration schemes and disseminating new product architectures in such di
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Silicon Molecular Beam Epitaxy
Language: en
Pages: 306
Authors: E. Kasper
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Type: BOOK - Published: 2018-05-04 - Publisher: CRC Press

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